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6" Fab For Sale from Moov - Click Here to Learn More
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PLASMATHERM 790
    说明
    无说明
    配置
    PECVD
    OEM 型号描述
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
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    PLASMATHERM

    790

    verified-listing-icon

    已验证

    类别
    Dry / Plasma Etch

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    100286


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch
    年份: 0状况: 二手
    上次验证5 天前

    PLASMATHERM

    790

    verified-listing-icon
    已验证
    类别
    Dry / Plasma Etch
    上次验证: 60 多天前
    listing-photo-64bd9918ae82471ab3b0168a3a17208a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    100286


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    PECVD
    OEM 型号描述
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    文件

    无文件

    类似上架物品
    查看全部
    PLASMATHERM 790

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    790

    Dry / Plasma Etch年份: 0状况: 二手上次验证:5 天前
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch年份: 1993状况: 二手上次验证:13 天前
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch年份: 0状况: 翻新上次验证:60 多天前