跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
说明
无说明
配置
Single chamber tool PECVD. 8" In Fab still running.
OEM 型号描述
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
文件

无文件

PREFERRED
 
SELLER
类别
Dry / Plasma Etch

上次验证: 60 多天前

Buyer pays 12% premium of final sale price
物品主要详细信息

状况:

Used


运行状况:

Installed / Running


产品编号:

105081


晶圆尺寸:

8"/200mm


年份:

1993


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

PLASMATHERM

790

verified-listing-icon
已验证
类别
Dry / Plasma Etch
上次验证: 60 多天前
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/5ad2b58debc940229c159bf3f866d4d4_59b4b90969234dcbbe54f96996e0f3f91201a_mw.jpeg
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/91b4691060c84e6e87d70b9e3e098624_b990009bce9f427787210cb7aa9a55401201a_mw.jpeg
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/0bb4aa0cd6994d2189eb93204e0ba72b_99868a6e16e7413991a9d688d5a807d545005c_mw.jpeg
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/f3341069044f494fafa36fae6deef07c_57f6981c5a8c4f5588ef7dca2086bfc045005c_mw.jpeg
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/8b05535cb5fd4a5d81857d4624b002a4_82993e5b7f4a4af49e7369cb282ba54a45005c_mw.jpeg
Buyer pays 12% premium of final sale price
物品主要详细信息

状况:

Used


运行状况:

Installed / Running


产品编号:

105081


晶圆尺寸:

8"/200mm


年份:

1993


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
Single chamber tool PECVD. 8" In Fab still running.
OEM 型号描述
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
文件

无文件