跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
说明
Multi-Process Etch
配置
无配置
OEM 型号描述
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
文件

无文件

类别
Dry / Plasma Etch

上次验证: 30 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

12709


晶圆尺寸:

8"/200mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

PLASMATHERM

790

verified-listing-icon
已验证
类别
Dry / Plasma Etch
上次验证: 30 多天前
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/f2c771707c0b8190bf6a048bec03238a393ccca7b990d77f9a3e90f6ca78a55c_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/36735c3bb47d1b29ef6d2aed0cfa406d86bd9f1bfdc7b36793b74dbfacc36c09_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/169053a4a860bce90d30ad7984fb9a12b6290fb8da8de2b5f1f14f3037fe60e2_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/4b74f70f71c624939e8a8ae35d16e03117e1ae73e6b80bbaddf8dd04f7f54325_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/7e537f99bd27518a521a0d2e46b5904163844085f7caf3abbcc5d008ce6afc0d_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/424472d4daead688216520dd21cc6be5d6478d3cd09f9b785849fcda4b1d5258_20200420_094044_f
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

12709


晶圆尺寸:

8"/200mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Multi-Process Etch
配置
无配置
OEM 型号描述
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
文件

无文件