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说明
无说明配置
DRIEOEM 型号描述
With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.文件
无文件
STS
HRM
类别
Dry / Plasma Etch
上次验证： 22 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
125378
晶圆尺寸：
4"/100mm, 6"/150mm, 8"/200mm
年份：
未知
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说明
无说明配置
DRIEOEM 型号描述
With market leading etch rates using a conventional de-coupled plasma source, the HRM provides a cost effective Deep Reactive lon Etch (DRIE) processing chamber. Designed to offer high etch rates while controlling ion damage, the HRM is ideal for deep anisotropic silicon etching using STS' ASE® process technology.文件
无文件