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APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Raider™ ECD310 is a fourth-generation, single-wafer, automated, multi-process electrochemical deposition tool. It delivers advanced metal processing in a small footprint and is available with cluster modules for metrology, plating, and cleaning. The Raider™ ECD310 incorporates programmable reactors that provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to deliver advanced metal processing capabilities in a compact package.
    文件

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    verified-listing-icon

    已验证

    类别
    Electro Plating

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    101022


    晶圆尺寸:

    未知


    年份:

    2010


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    Electro Plating
    年份: 2010状况: 二手
    上次验证60 多天前

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    verified-listing-icon
    已验证
    类别
    Electro Plating
    上次验证: 60 多天前
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    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    101022


    晶圆尺寸:

    未知


    年份:

    2010


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Raider™ ECD310 is a fourth-generation, single-wafer, automated, multi-process electrochemical deposition tool. It delivers advanced metal processing in a small footprint and is available with cluster modules for metrology, plating, and cleaning. The Raider™ ECD310 incorporates programmable reactors that provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to deliver advanced metal processing capabilities in a compact package.
    文件
    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    Electro Plating年份: 2010状况: 二手上次验证:60 多天前
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    Electro Plating年份: 0状况: 二手上次验证:60 多天前
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    Electro Plating年份: 2009状况: 二手上次验证:60 多天前