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KLA ALERIS 8350
    说明
    THIN FILMS MEASUREMENT TOOL; CU
    配置
    无配置
    OEM 型号描述
    The Aleris 8350 is a high-performance film metrology system that meets the tighter process tolerances required for thickness, refractive index and stress measurements on critical films. The Aleris 8350 film thickness measurement system is used for advanced film development, characterization and process control for a wide range of critical films, including ultra-thin diffusion layers, ultra-thin gate oxides, advanced photoresists, 193nm ARC layers, ultra-thin multi-layer stacks, and CVD layers.
    文件

    无文件

    KLA

    ALERIS 8350

    verified-listing-icon

    已验证

    类别
    Elipsometry

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    101672


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    KLA ALERIS 8350

    KLA

    ALERIS 8350

    Elipsometry
    年份: 0状况: 二手
    上次验证24 天前

    KLA

    ALERIS 8350

    verified-listing-icon
    已验证
    类别
    Elipsometry
    上次验证: 60 多天前
    listing-photo-cf229f2192d74ebab700cb47ec36c452-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    101672


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    THIN FILMS MEASUREMENT TOOL; CU
    配置
    无配置
    OEM 型号描述
    The Aleris 8350 is a high-performance film metrology system that meets the tighter process tolerances required for thickness, refractive index and stress measurements on critical films. The Aleris 8350 film thickness measurement system is used for advanced film development, characterization and process control for a wide range of critical films, including ultra-thin diffusion layers, ultra-thin gate oxides, advanced photoresists, 193nm ARC layers, ultra-thin multi-layer stacks, and CVD layers.
    文件

    无文件

    类似上架物品
    查看全部
    KLA ALERIS 8350

    KLA

    ALERIS 8350

    Elipsometry年份: 0状况: 二手上次验证:24 天前
    KLA ALERIS 8350

    KLA

    ALERIS 8350

    Elipsometry年份: 0状况: 二手上次验证:30 多天前
    KLA ALERIS 8350

    KLA

    ALERIS 8350

    Elipsometry年份: 0状况: 二手上次验证:60 多天前