说明
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Brand : ASM America Type : EPSILON ONE, converted to E2000 Wafer size: 6” standard pitch/tall pitch ASM carriers, 8” compatible Bernoulli wand ATM reactor Gas system : TCS with ASM LVC, from separate LPE bubbler Diluted dopant flow for 1 line of N-dope and 1 line P-dope 5 port MPI injector Swing gate valve Software Vs 7.25.03 Host control.OEM 型号描述
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.文件
ASM
EPSILON E2000
已验证
类别
Epitaxial deposition (EPI)
上次验证： 15 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Idle
产品编号：
91299
晶圆尺寸：
6"/150mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ASM
EPSILON E2000
类别
Epitaxial deposition (EPI)
上次验证： 15 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Idle
产品编号：
91299
晶圆尺寸：
6"/150mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available