
说明
无说明配置
无配置OEM 型号描述
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.文件
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PREFERRED
SELLER
类别
Epitaxial deposition (EPI)
上次验证: 60 多天前
Buyer pays 12% premium of final sale price
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
112677
晶圆尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SELLER
ASM
EPSILON E2000
类别
Epitaxial deposition (EPI)
上次验证: 60 多天前
Buyer pays 12% premium of final sale price
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
112677
晶圆尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.文件
无文件