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说明
无说明配置
Plasmalab 80 Plus RIE Etcher - Single Chamber RIE, non-load locked - Ideal for R&D reactive ion etch applications - Process: Dielectric etch and Descum - System setup with universal platen (with ability to place various size(s) of substrates). - Up to 200mm wafer capable - System PC, Keyboard, Mouse - RF Generator - Leybold Vacuum Pump - Neslab Chiller - Operations Manual and Documentation - Fully Refurbished to excellent condition - System Dimensions: 23 x 32 x 60 inches Gas Box: - N2 - Ar - O2 - SF6 - CHF3 PROCESS consists of: - Chamber disassembled for refurbishment. - Chamber received full wet clean. - Chamber o-rings and seals are replaced with brand new. - Electrostatic Chuck (ESC) sent out for refurbishment (if applicable - All MFCs rebuilt and calibrated professionally. - All corrosive gas lines replaced with brand new. - All Non-corrosive gas lines purged. - Vacuum pumps professionally rebuilt. - Turbo pump professionally rebuilt. - Chillers serviced and fully tested. - All wiring/wire harnesses are checked, repaired or replaced if needed. - All liquid and air lines, tubing and fittings checked and replaced if necessary - Major components disassembled for checkout, servicing, cleaning, and lubricating. Parts are repaired or replaced as needed. - Checkout of all electronic and mechanical parts. - Machine covers are cleaned, polished or replaced as needed. - Post-refurbishment system leak and RF calibration checks, with documentation provided to customer. - System cycle and repeatability testing completed prior to cover replacement and wipe down. - System components carefully packed, labeled, and professionally crated.OEM 型号描述
The Oxford Plasmalab80Plus is a compact plasma processing system that can perform high-quality plasma-enhanced chemical vapor deposition (PECVD) of materials such as SiOx, SiNx, and SiOxNy. This system is suitable for a variety of applications, including the creation of photonics structures, passivation, and hard masks. The Plasmalab80Plus has a small footprint and offers versatile etch and deposition solutions with easy open loading. It is simple to install and operate, while still delivering excellent process quality. The open load design allows for quick wafer loading and unloading, making it ideal for research, prototyping, and low-volume production. The system also enables high-performance processes through optimized electrode cooling and precise substrate temperature control.文件
无文件
类别
Etch/Asher
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
60108
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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OXFORD
PLASMALAB 80 PLUS
类别
Etch/Asher
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
60108
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Plasmalab 80 Plus RIE Etcher - Single Chamber RIE, non-load locked - Ideal for R&D reactive ion etch applications - Process: Dielectric etch and Descum - System setup with universal platen (with ability to place various size(s) of substrates). - Up to 200mm wafer capable - System PC, Keyboard, Mouse - RF Generator - Leybold Vacuum Pump - Neslab Chiller - Operations Manual and Documentation - Fully Refurbished to excellent condition - System Dimensions: 23 x 32 x 60 inches Gas Box: - N2 - Ar - O2 - SF6 - CHF3 PROCESS consists of: - Chamber disassembled for refurbishment. - Chamber received full wet clean. - Chamber o-rings and seals are replaced with brand new. - Electrostatic Chuck (ESC) sent out for refurbishment (if applicable - All MFCs rebuilt and calibrated professionally. - All corrosive gas lines replaced with brand new. - All Non-corrosive gas lines purged. - Vacuum pumps professionally rebuilt. - Turbo pump professionally rebuilt. - Chillers serviced and fully tested. - All wiring/wire harnesses are checked, repaired or replaced if needed. - All liquid and air lines, tubing and fittings checked and replaced if necessary - Major components disassembled for checkout, servicing, cleaning, and lubricating. Parts are repaired or replaced as needed. - Checkout of all electronic and mechanical parts. - Machine covers are cleaned, polished or replaced as needed. - Post-refurbishment system leak and RF calibration checks, with documentation provided to customer. - System cycle and repeatability testing completed prior to cover replacement and wipe down. - System components carefully packed, labeled, and professionally crated.OEM 型号描述
The Oxford Plasmalab80Plus is a compact plasma processing system that can perform high-quality plasma-enhanced chemical vapor deposition (PECVD) of materials such as SiOx, SiNx, and SiOxNy. This system is suitable for a variety of applications, including the creation of photonics structures, passivation, and hard masks. The Plasmalab80Plus has a small footprint and offers versatile etch and deposition solutions with easy open loading. It is simple to install and operate, while still delivering excellent process quality. The open load design allows for quick wafer loading and unloading, making it ideal for research, prototyping, and low-volume production. The system also enables high-performance processes through optimized electrode cooling and precise substrate temperature control.文件
无文件