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说明
Alpha303i-k , Anneal / D-Poly / PIQ / SIN (Depend Process with FTPS , RCU , VOS-56-003 , VMM-56-201 , VMM-56-002 , Load Lock Option )配置
FuranceOEM 型号描述
The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.文件
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PREFERRED
SELLER
类别
Furnaces / Diffusion
上次验证： 14 天前
Buyer pays 12% premium of final sale price
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
103652
晶圆尺寸：
12"/300mm
Process:
Anneal / D-Poly / NIT / PIQ
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PREFERRED
SELLER
TEL / TOKYO ELECTRON
ALPHA(α)-303i
类别
Furnaces / Diffusion
上次验证： 14 天前
Buyer pays 12% premium of final sale price
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
103652
晶圆尺寸：
12"/300mm
Process:
Anneal / D-Poly / NIT / PIQ
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Alpha303i-k , Anneal / D-Poly / PIQ / SIN (Depend Process with FTPS , RCU , VOS-56-003 , VMM-56-201 , VMM-56-002 , Load Lock Option )配置
FuranceOEM 型号描述
The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.文件
无文件