说明
MISSING PARTS: (1 set) Quartz wares - Process tube, etc. Type: Diffusion Air valve: FUJIKIN Heater: VMM-56-002 MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 440V Single phase power: 1Ø AC 100V Main/APC: CKD GAS: PN2 , SiH4 , 0.1%PH3/He配置
ALPHA 303i-H The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas subsystem includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 型号描述
The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.文件
无文件
TEL / TOKYO ELECTRON
ALPHA(α)-303i
已验证
类别
Furnaces / Diffusion
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
72834
晶圆尺寸：
12"/300mm
年份：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部
TEL / TOKYO ELECTRON
ALPHA(α)-303i
类别
Furnaces / Diffusion
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
72834
晶圆尺寸：
12"/300mm
年份：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
MISSING PARTS: (1 set) Quartz wares - Process tube, etc. Type: Diffusion Air valve: FUJIKIN Heater: VMM-56-002 MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 440V Single phase power: 1Ø AC 100V Main/APC: CKD GAS: PN2 , SiH4 , 0.1%PH3/He配置
ALPHA 303i-H The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas subsystem includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 型号描述
The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.文件
无文件