概述

The Quantum X Plus is a groundbreaking single-wafer, high-current implanter that has set new standards in 65nm production. It offers superior low-energy, high-dose performance, enabling device scaling and delivering exceptional capabilities for Logic and Memory applications. The implanter's fixed beam technology, combined with a precision mechanical scanning system, provides unmatched features such as defect engineering for ultra-shallow junction formation below 45nm and precise angle control for advanced memory structures. When paired with the Applied Vantage RadiancePlus RTP, the Quantum X Plus forms a powerful combination, incorporating cutting-edge co-implantation and defect engineering technology to meet both current and future high-current implantation requirements. Key features of the Quantum X Plus include the highest productivity for ultra-shallow junction formation across a wide energy range, two-dimensional parallel scanning with StepScan for precise angle control and iso-centric scanning for high tilt applications, advanced motion control for optimal crystal defect management, and predictive and managed uniformity for consistent implant results.