The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.

Designs, manufactures and services ion implantation and other processing equipment used in the fabrication of semiconductor chips.

GSD 200E2

类别

概述

活动的上架物品

服务

热门上架物品

使用 Moov 上架，立即找到完美买家。