说明
无说明配置
IMPLANTER_HIGH CURRENTOEM 型号描述
The NV-GSD III-80 is a high-current ion implanter that has become a de facto standard in the industry. It is versatile, supporting a medium-current range and various applications, thanks to its post-deflection acceleration system. It caters to different wafer sizes, supporting 5, 6, and 8-inch wafers. The implanter offers a wide range of implantation energy from 2 to 180 keV, facilitated by its unique acceleration mechanism. It also features a reliable batch transfer system for smooth operations and highly effective throughput for increased productivity. The NV-GSD III-80 ensures precise results with its reliable high-dose control accuracy and maintains the integrity of the process with its high beam quality that results in low metal contamination and low cross-contamination.文件
无文件
类别
High Current
上次验证： 11 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
140463
晶圆尺寸：
6"/150mm
年份：
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AXCELIS
NV GSD III 180
类别
High Current
上次验证： 11 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
140463
晶圆尺寸：
6"/150mm
年份：
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
IMPLANTER_HIGH CURRENTOEM 型号描述
The NV-GSD III-80 is a high-current ion implanter that has become a de facto standard in the industry. It is versatile, supporting a medium-current range and various applications, thanks to its post-deflection acceleration system. It caters to different wafer sizes, supporting 5, 6, and 8-inch wafers. The implanter offers a wide range of implantation energy from 2 to 180 keV, facilitated by its unique acceleration mechanism. It also features a reliable batch transfer system for smooth operations and highly effective throughput for increased productivity. The NV-GSD III-80 ensures precise results with its reliable high-dose control accuracy and maintains the integrity of the process with its high beam quality that results in low metal contamination and low cross-contamination.文件
无文件