说明
无说明配置
Compressor: Genesis 2.1 X 4 EA Chamber Cryo Pump: Varian Source Dry Pump: Edward Beamline High Vac Pump: Varian Diffusion LL Rough Pump: EdwardOEM 型号描述
The Varian 120XP High Current Ion Implanter it can handle wafer sizes of 100mm, 125mm, and 150mm. It is optimized for maximum dose uniformity and repeatability, has reduced particulate contamination, and is a production-proven solution with the industry’s lowest cost of ownership (CoO) and high throughput.文件
无文件
APPLIED MATERIALS (AMAT) / VARIAN
120XP
已验证
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
24732
晶圆尺寸：
未知
年份：
1989
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
120XP
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
24732
晶圆尺寸：
未知
年份：
1989
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Compressor: Genesis 2.1 X 4 EA Chamber Cryo Pump: Varian Source Dry Pump: Edward Beamline High Vac Pump: Varian Diffusion LL Rough Pump: EdwardOEM 型号描述
The Varian 120XP High Current Ion Implanter it can handle wafer sizes of 100mm, 125mm, and 150mm. It is optimized for maximum dose uniformity and repeatability, has reduced particulate contamination, and is a production-proven solution with the industry’s lowest cost of ownership (CoO) and high throughput.文件
无文件