说明
TUBING,CENTER,RH,ROTATING MASS SLIT P/N: E12004040/E11084590 TUBING,CENTER,LH,ROTATING MASS SLIT P/N: E11084591/E12004041配置
无配置OEM 型号描述
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.文件
无文件
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
已验证
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
54324
晶圆尺寸：
6"/150mm, 8"/200mm
年份：
2022
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
54324
晶圆尺寸：
6"/150mm, 8"/200mm
年份：
2022
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
TUBING,CENTER,RH,ROTATING MASS SLIT P/N: E12004040/E11084590 TUBING,CENTER,LH,ROTATING MASS SLIT P/N: E11084591/E12004041配置
无配置OEM 型号描述
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.文件
无文件