说明
HE-Ion Implanter Comes with pumps and chillers配置
-High energy batch implant tool, 200mm capability -Energy range 10 – 3750keV -10-site-disk → 10 wafers per batch @200mm wafer diameter, automatic handling system, -Fully automated gas box → 4 gas modules •Argon (factory inlet), •PH3 SDS® •AsH3 SDS® •BF3 SDS® -On-Board-Argon option installed (semi automated filling of stripper reservoirs), -SECS/GEM Factory automation available, Software version 6.41OEM 型号描述
未提供文件
APPLIED MATERIALS (AMAT) / VARIAN
KESTREL
已验证
类别
High Current
上次验证: 16 天前
物品主要详细信息
状况:
Used
运行状况:
Installed / Running
产品编号:
111719
晶圆尺寸:
未知
年份:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
KESTREL
类别
High Current
上次验证: 16 天前
物品主要详细信息
状况:
Used
运行状况:
Installed / Running
产品编号:
111719
晶圆尺寸:
未知
年份:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available