说明
High-Energy Ion Implanter配置
Ion Source Assembly Mass Analyzer Magnet RF Linear Accelerator (Multi-Stage RF Resonant Cavities) Wafer Processing Station Power Distribution Rack Vacuum Measurement Control Cabinets Wafer loading interface (EFEM/load port)OEM 型号描述
High energy implanter. processing 300-mm wafers, the HE3 produces higher ion energies than the GSD/HE in a package that incorporates higher efficiency linear accelerator technology. The system layout has also been optimized so that footprint is reduced compared to the GSD/VHE while maintaining the same twin well and triple well process capability. A new endstation capable of batch processing 300-mm wafers, at a mechanical throughput equal to or exceeding that for 200-mm wafers in the GSD/HE system, has been developed.文件
无文件
类别
Ion Implantation
上次验证： 2 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
158121
晶圆尺寸：
未知
年份：
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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AXCELIS
NV GSD HE3
类别
Ion Implantation
上次验证： 2 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
158121
晶圆尺寸：
未知
年份：
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
High-Energy Ion Implanter配置
Ion Source Assembly Mass Analyzer Magnet RF Linear Accelerator (Multi-Stage RF Resonant Cavities) Wafer Processing Station Power Distribution Rack Vacuum Measurement Control Cabinets Wafer loading interface (EFEM/load port)OEM 型号描述
High energy implanter. processing 300-mm wafers, the HE3 produces higher ion energies than the GSD/HE in a package that incorporates higher efficiency linear accelerator technology. The system layout has also been optimized so that footprint is reduced compared to the GSD/VHE while maintaining the same twin well and triple well process capability. A new endstation capable of batch processing 300-mm wafers, at a mechanical throughput equal to or exceeding that for 200-mm wafers in the GSD/HE system, has been developed.文件
无文件