说明
Raith 150-TWO Electron Beam Lithography System, configured for 6in wafer, Zeiss Ultra-55 SEM base 208-240V, w/ HiTek G303/51 HV power supply, LISO laser head, BB-8KV beam blank controller, TBMS precision stage controller, Elphy VII high speed pattern processor, loadlock controller, laser interferometer source, Keithley 6485 picoammeter, Evactron 10 RF plasma cleaner, RT control & motor control pendants ncludes: Thermo Neslab Merlin M75 recirculating chiller配置
无配置OEM 型号描述
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.文件
无文件
RAITH
150 TWO
类别
Lithography
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
135810
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Raith 150-TWO Electron Beam Lithography System, configured for 6in wafer, Zeiss Ultra-55 SEM base 208-240V, w/ HiTek G303/51 HV power supply, LISO laser head, BB-8KV beam blank controller, TBMS precision stage controller, Elphy VII high speed pattern processor, loadlock controller, laser interferometer source, Keithley 6485 picoammeter, Evactron 10 RF plasma cleaner, RT control & motor control pendants ncludes: Thermo Neslab Merlin M75 recirculating chiller配置
无配置OEM 型号描述
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.文件
无文件