
说明
process 1ch配置
IA_MidCurOEM 型号描述
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.文件
无文件
类别
Medium Current
上次验证: 12 天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
144807
晶圆尺寸:
12"/300mm
年份:
2023
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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查看全部SEN CORPORATION / SUMITOMO
NV MC3
类别
Medium Current
上次验证: 12 天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
144807
晶圆尺寸:
12"/300mm
年份:
2023
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
process 1ch配置
IA_MidCurOEM 型号描述
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.文件
无文件