APPLIED MATERIALS (AMAT) / VARIAN E220-HP

说明

Implanter system Without the missing parts

配置

Vacuum system 2 stage pump: Edward QDP E/S rough pump: Edward QDP Source Roughing pump: Edward QDP Compressor: CTI-9600 He line: Yes Target Cryo: CT-250F Load Lock pump: V300HT Source Pump: STP-1000C Aperture pump: STP-301 Scanner pump: STP-1000C Vacuum system: CCIG Cooling system: Yes Vacuum system centerring and clamp Source and beamline foreline TC guage: No Software Software Version: V13.20 Dual HD: No Wafer handler system Wafer Size: 8" Hand off type: No Handler motor: Yes Platen(E-Clamp): Yes Roplat head E-clamp: Yes Roplat cable: Yes Tilter Assy P/N: Yes Linear motor servo controller: Yes PlatenTilter servo controller: Yes Rotating Platen/ ScanFara controller: Yes Ropins motor: Yes Scan field forcer: Yes Heat Exchange: Yes Orienter motor encoder: Yes Orienter controller: Yes Orienter lifter controller: Yes Orentor DD motor orientor stage: Normal Type Wafer walk out: Yes Right elevator controller: Yes Left elevator controller: Yes Mapping sensor: Yes cassette/Tilt sensor: Normal Type Cassette present: Normal Type Service Monitor: No Door open sensor: Normal Type Cassette nest: Yes Gas supply system Gas bottle type: SDS Gas bottle: 3 Gas box type: HP Gasline: Yes Beam generation/ source Ion Source: Yes Vaporizer : No Arc PS: Yes Filament PS: Yes Extraction PS: Yes Extraction suppression PS: Yes AMU power supply: Yes Lens power supply: Yes Source Bushing P/N: Yes 2 Step Reducer: Yes Beam generation/ Beam-line Trek amplifier: Yes Acceleration PS: Yes Acceleration suppression PS: Yes Acceleration column: Yes Mirror PS: No Decel P.S.: Yes Accel/Decel switch hardware: No Scan generator PCB: Yes Scan generator controller: Yes beam measurement and scan check Uniformity controller: Yes Dose integrator control: Yes Beam purity check: Yes Faraday: Yes Main power 50A CVCF: No 80KVA UPS: No Quality kit Metal reduction kit: Yes Hall Probe: No Energy probe: Yes Camera: Yes Automation Host: Y Manpower Tool installation