说明
Film Thickness Measurement System配置
无配置OEM 型号描述
The Trajectory T³ is a cutting-edge metrology module developed by Nanometrics for monitoring and controlling critical processes in semiconductor fabs worldwide. It has been approved for integration by leading process tool manufacturers and has set new standards for speed, reliability, and cost. With its robust large area optical collectors, simple yet powerful spectral detectors, and a MTBF of over 10,000 hours, the Trajectory T³ minimizes cost while maximizing performance. Capable of processing over 250 wafers per hour, it can measure every process wafer even on the fastest process tools. By enabling process tools to measure thicknesses inside the tool and inside the wafer’s patterned devices, the Trajectory T³ delivers unparalleled advantages in speed, reliability, and cost. It is truly changing the game in integrated metrology.文件
无文件
ONTO / NANOMETRICS / ACCENT / BIO-RAD
TRAJECTORY T3
已验证
类别
Metrology
上次验证： 17 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
83162
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / NANOMETRICS / ACCENT / BIO-RAD
TRAJECTORY T3
类别
Metrology
上次验证： 17 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
83162
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Film Thickness Measurement System配置
无配置OEM 型号描述
The Trajectory T³ is a cutting-edge metrology module developed by Nanometrics for monitoring and controlling critical processes in semiconductor fabs worldwide. It has been approved for integration by leading process tool manufacturers and has set new standards for speed, reliability, and cost. With its robust large area optical collectors, simple yet powerful spectral detectors, and a MTBF of over 10,000 hours, the Trajectory T³ minimizes cost while maximizing performance. Capable of processing over 250 wafers per hour, it can measure every process wafer even on the fastest process tools. By enabling process tools to measure thicknesses inside the tool and inside the wafer’s patterned devices, the Trajectory T³ delivers unparalleled advantages in speed, reliability, and cost. It is truly changing the game in integrated metrology.文件
无文件