跳至主要内容
Moov logo

Moov Icon
KLA ARCHER AIM+
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Archer AIM+ is an advanced optical overlay metrology tool that sets the standard for lithography process control through the > 45-nm node. It improves yield and cost of ownership with a 20% increase in throughput over previous-generation solutions. It features field-proven AIM grating-style technology, improved optics design, and high accuracy measurements. Its applications include overlay metrology, CMP, lithography, and wafer surface focus and analysis.
    文件

    无文件

    KLA

    ARCHER AIM+

    verified-listing-icon

    已验证

    类别
    Metrology

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Refurbished


    运行状况:

    未知


    产品编号:

    63976


    晶圆尺寸:

    未知


    年份:

    未知

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    KLA ARCHER AIM+

    KLA

    ARCHER AIM+

    Metrology
    年份: 0状况: 二手
    上次验证5 天前

    KLA

    ARCHER AIM+

    verified-listing-icon
    已验证
    类别
    Metrology
    上次验证: 60 多天前
    listing-photo-108080b2309943e3b6a4aa3d92e961bb-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Refurbished


    运行状况:

    未知


    产品编号:

    63976


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Archer AIM+ is an advanced optical overlay metrology tool that sets the standard for lithography process control through the > 45-nm node. It improves yield and cost of ownership with a 20% increase in throughput over previous-generation solutions. It features field-proven AIM grating-style technology, improved optics design, and high accuracy measurements. Its applications include overlay metrology, CMP, lithography, and wafer surface focus and analysis.
    文件

    无文件

    类似上架物品
    查看全部
    KLA ARCHER AIM+

    KLA

    ARCHER AIM+

    Metrology年份: 0状况: 二手上次验证: 5 天前
    KLA ARCHER AIM+

    KLA

    ARCHER AIM+

    Metrology年份: 0状况: 二手上次验证: 60 多天前
    KLA ARCHER AIM+

    KLA

    ARCHER AIM+

    Metrology年份: 0状况: 翻新上次验证: 60 多天前