MetaPULSE-III 300 is designed specifically to meet semiconductor manufacturers' metal thin-film metrology requirements at the 45 nm technology node and beyond. The modular design of the MetaPULSE-III offers Rudolph's patented PULSE Technology.

Onto Innovation is a worldwide leader in the design, development, manufacture and support of process control tools that perform macro defect inspections and metrology, lithography systems, and process control analytical software used by semiconductor wafer and advanced packaging device manufacturers. 

MetaPULSE-III 300

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