说明
SSM 5200 Automatic CV System for CV/QV/IV Fully automated capacitance-voltage(CV),charge-voltage(QV), and current-voltage(IV) system [Direct Measurement] - Accurately measure CV, QV and IV characteristics of MOS test structures in scribe lines on product wafers. [Pattern Recognition] - Vision system for fast pattern recognition for automatic placement of measurement probe. [Cassette-To-Cassette Loading/Unloading] - Robotic loading and unloading of wafers with flat or notch alignment. Fast - Effective oxide charge and carrier density measurements in 50seconds, ion implant dose in 20 seconds.配置
无配置OEM 型号描述
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.文件
无文件
SSM
5200
已验证
类别
Metrology
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
17283
晶圆尺寸：
8"/200mm
年份：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SSM
5200
类别
Metrology
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
17283
晶圆尺寸：
8"/200mm
年份：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
SSM 5200 Automatic CV System for CV/QV/IV Fully automated capacitance-voltage(CV),charge-voltage(QV), and current-voltage(IV) system [Direct Measurement] - Accurately measure CV, QV and IV characteristics of MOS test structures in scribe lines on product wafers. [Pattern Recognition] - Vision system for fast pattern recognition for automatic placement of measurement probe. [Cassette-To-Cassette Loading/Unloading] - Robotic loading and unloading of wafers with flat or notch alignment. Fast - Effective oxide charge and carrier density measurements in 50seconds, ion implant dose in 20 seconds.配置
无配置OEM 型号描述
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.文件
无文件