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SSM 5200
  • SSM 5200
  • SSM 5200
  • SSM 5200
  • SSM 5200
  • SSM 5200
说明
SSM 5200 Automatic CV System for CV/QV/IV Fully automated capacitance-voltage(CV),charge-voltage(QV), and current-voltage(IV) system [Direct Measurement] - Accurately measure CV, QV and IV characteristics of MOS test structures in scribe lines on product wafers. [Pattern Recognition] - Vision system for fast pattern recognition for automatic placement of measurement probe. [Cassette-To-Cassette Loading/Unloading] - Robotic loading and unloading of wafers with flat or notch alignment. Fast - Effective oxide charge and carrier density measurements in 50seconds, ion implant dose in 20 seconds.
配置
无配置
OEM 型号描述
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.
文件

无文件

verified-listing-icon

已验证

类别
Metrology

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

17283


晶圆尺寸:

8"/200mm


年份:

1997


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

SSM

5200

verified-listing-icon
已验证
类别
Metrology
上次验证: 60 多天前
listing-photo-hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA/8a0afbf43cc14a0f82887db09983b9f2_001_mw.png
listing-photo-hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA/07bbd79e20b74f47986a348304d4bf00_004_mw.png
listing-photo-hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA/eee9e501f52b4232ade0529d815d1e0a_005_mw.png
listing-photo-hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA/858d64ff425142518893612331c7a91a_003_mw.png
listing-photo-hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/hrykXKOnkz0seY-aWpTle644Ll0MRs4zFFx3V7o6JYA/b1311cd7bd084dbca5bad51f17eabf24_002_mw.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

17283


晶圆尺寸:

8"/200mm


年份:

1997


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
SSM 5200 Automatic CV System for CV/QV/IV Fully automated capacitance-voltage(CV),charge-voltage(QV), and current-voltage(IV) system [Direct Measurement] - Accurately measure CV, QV and IV characteristics of MOS test structures in scribe lines on product wafers. [Pattern Recognition] - Vision system for fast pattern recognition for automatic placement of measurement probe. [Cassette-To-Cassette Loading/Unloading] - Robotic loading and unloading of wafers with flat or notch alignment. Fast - Effective oxide charge and carrier density measurements in 50seconds, ion implant dose in 20 seconds.
配置
无配置
OEM 型号描述
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.
文件

无文件