说明
-Installed and running -Equipment status: Operational. This machine GaN process. It can be used for both 4-inch and 6-inch wafers (previously used for 4-inch and now producing 6-inch). Only additional purchases of replacement hot plates and related accessories are required. Parts details attached配置
-Previously, the GaN growth was on 4-inch wafers, now it's on 6-inch wafers, all in six pieces. -Schematic and circuit data for the equipment. -Equipment: Photos of the reaction chamber (upper, inside, and below), and gas source piping with equipment door open. -Human-machine interface software version: EpiTT_TWO. -PLC, SLC, and RF generator details.OEM 型号描述
The AIXTRON AIX 2800 G4 HT (High-Temperature) is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. It is designed specifically for high-temperature processing and the epitaxial growth of compound semiconductor materials.文件
AIXTRON
AIX 2800 G4 HT
已验证
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
104853
晶圆尺寸：
4"/100mm, 6"/150mm
年份：
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AIXTRON
AIX 2800 G4 HT
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
104853
晶圆尺寸：
4"/100mm, 6"/150mm
年份：
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available