说明
No missing parts配置
AMEC PD5 MoCVD Process Application : GaN Power Epitaxy Wafer Type : 11x4”, 6x6”, 3x8” GaN on Silicon/SiC Transfer Module : Yes, able to support up to 4 chambers Pump : Edwards iXH645H Chiller : SMC MFCs Type : Horiba MO Configuration : TMGa1/2, TMAl1/2, TEGa, Cp2Fe, TMIn, Cp2Mg Doping Source : 2x External Dopant inlet Inline Purifiers : H2, N2, NH3 Dew Point Sensor : H2, N2OEM 型号描述
MOCVD system for production of GaN power devices文件
无文件
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (AMEC)
Prismo PD5
已验证
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
97816
晶圆尺寸：
未知
年份：
2020
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA (AMEC)
Prismo PD5
类别
MOCVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
97816
晶圆尺寸：
未知
年份：
2020
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
No missing parts配置
AMEC PD5 MoCVD Process Application : GaN Power Epitaxy Wafer Type : 11x4”, 6x6”, 3x8” GaN on Silicon/SiC Transfer Module : Yes, able to support up to 4 chambers Pump : Edwards iXH645H Chiller : SMC MFCs Type : Horiba MO Configuration : TMGa1/2, TMAl1/2, TEGa, Cp2Fe, TMIn, Cp2Mg Doping Source : 2x External Dopant inlet Inline Purifiers : H2, N2, NH3 Dew Point Sensor : H2, N2OEM 型号描述
MOCVD system for production of GaN power devices文件
无文件