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SPTS / APPLIED MICROSTRUCTURES MVD 100
  • SPTS / APPLIED MICROSTRUCTURES MVD 100
  • SPTS / APPLIED MICROSTRUCTURES MVD 100
  • SPTS / APPLIED MICROSTRUCTURES MVD 100
  • SPTS / APPLIED MICROSTRUCTURES MVD 100
说明
无说明
配置
Manual Loading / up to an 8" round substrate x 1.2" deep. (9.5" x 9.5" x 1") Typical Capacity: Can accommodate die or special devices through manual loading Chamber is 4",6",8" compatible Up to three (3) 8" wafers with a special holder Up to three (3) 6" wafers with a special holder (Heated) (0-10torr) Fully Integrated Inductively Coupled Downstream Plasma Source for surface modification and cleaning Includes Gate Valve Isolation of Plasma Source Electronic Mass Flow Controller for Plasma Source gas control - Oxygen 13.56MHz
OEM 型号描述
Molecular Vapor Deposition System
文件

无文件

类别
MVD

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

101796


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

SPTS / APPLIED MICROSTRUCTURES

MVD 100

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已验证
类别
MVD
上次验证: 60 多天前
listing-photo-1a0eea841f424d1ebe2f7c82a81a966f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/40346/1a0eea841f424d1ebe2f7c82a81a966f/99fd89c8d0624660997994d9159d7a33_ea1262bb67624d7f83afd392a106101e1201a_mw.jpeg
listing-photo-1a0eea841f424d1ebe2f7c82a81a966f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/40346/1a0eea841f424d1ebe2f7c82a81a966f/8220e7c4503b40ad973d1aca2687be36_be204071c5ba41f6afaf051c940d8fac1201a_mw.jpeg
listing-photo-1a0eea841f424d1ebe2f7c82a81a966f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/40346/1a0eea841f424d1ebe2f7c82a81a966f/cfe2fd08827648ae858d9bc52d08e429_65d997055e6b40adb9c9eab8b26dcf39_mw.jpeg
listing-photo-1a0eea841f424d1ebe2f7c82a81a966f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/40346/1a0eea841f424d1ebe2f7c82a81a966f/38919d81df7f41a08875ad204dd8be0c_0ed832ee7cce4981b3abe9af45a0a4b51201a_mw.jpeg
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

101796


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
Manual Loading / up to an 8" round substrate x 1.2" deep. (9.5" x 9.5" x 1") Typical Capacity: Can accommodate die or special devices through manual loading Chamber is 4",6",8" compatible Up to three (3) 8" wafers with a special holder Up to three (3) 6" wafers with a special holder (Heated) (0-10torr) Fully Integrated Inductively Coupled Downstream Plasma Source for surface modification and cleaning Includes Gate Valve Isolation of Plasma Source Electronic Mass Flow Controller for Plasma Source gas control - Oxygen 13.56MHz
OEM 型号描述
Molecular Vapor Deposition System
文件

无文件