说明
无说明配置
KLA OVERLAYOEM 型号描述
The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.文件
无文件
类别
Overlay
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
129775
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
ARCHER 300
类别
Overlay
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
129775
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
KLA OVERLAYOEM 型号描述
The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.文件
无文件