说明
Complete with HDD and SW Included配置
Novellus C1 PECVD Oxide ReactorOEM 型号描述
The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.文件
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LAM RESEARCH / NOVELLUS
CONCEPT ONE "C1"
已验证
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
112455
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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LAM RESEARCH / NOVELLUS
CONCEPT ONE "C1"
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
112455
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Complete with HDD and SW Included配置
Novellus C1 PECVD Oxide ReactorOEM 型号描述
The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.文件
无文件