说明
PECVD Silane配置
Wafer Size (inches) - 6 Wafer Type - FLAT Install Type - STAND ALONE Software Version - 4.433 Is System On-Line? - YES CE Mark Certified? - YES Clean Room Manuals - NO Standard Manuals - YES Decontamination Report Exists? - YES Can Produce Wafers AS IS? - YES Any Known Field Modifications? - NO All Cables Present? - YES Frame Type - C1-150 Process Types - SiO2, SiN, Nitride Chamber Type - Dielectric Directory of Chamber Types for Box 3 - Process Tungsten - Tungsten Dep. Dielectric - SiO2, SiN, NitridE Signal Lamp Tower - YES Computer Type - Y2K Pentium Computer W/4.433 SW Robot Type - Single arm C1 Cassette Platform - 150mm Front Monitor - LCD Side Monitor - LCD Integrated SMIF - NO SECS / GEMS - YES Micro Contamination Option - YES Process Type - Dielectric Heater Block P/N - Pinned, scribed (CPS) Shower Head P/N - OEM Shower heads, 8 stations Digital Dynamics IOC - NO Heated Valves - YES Gate Valve Mfg & Model - VAT Throttle Valve - VAT RF Match Type - TRAZAR HF RF Generator - RFG3000 LF RF Generator - PDX1400 Sigma 6 TEOS Cabinet - NO Duraflo Cabinet - NO End Point Detector - YES Included With System- NO Manufacturer- Edwards Included With System- YES Gas Line # Gas 1 N2 2 SiH4 3 SiH4 2% 4 PH3 5 N2O 6 NH3 7 C2F6 8 O2 *gases not in a specific orderOEM 型号描述
The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.文件
无文件
类别
PECVD
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150809
晶圆尺寸：
6"/150mm
年份：
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS
CONCEPT ONE "C1"
类别
PECVD
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150809
晶圆尺寸：
6"/150mm
年份：
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
PECVD Silane配置
Wafer Size (inches) - 6 Wafer Type - FLAT Install Type - STAND ALONE Software Version - 4.433 Is System On-Line? - YES CE Mark Certified? - YES Clean Room Manuals - NO Standard Manuals - YES Decontamination Report Exists? - YES Can Produce Wafers AS IS? - YES Any Known Field Modifications? - NO All Cables Present? - YES Frame Type - C1-150 Process Types - SiO2, SiN, Nitride Chamber Type - Dielectric Directory of Chamber Types for Box 3 - Process Tungsten - Tungsten Dep. Dielectric - SiO2, SiN, NitridE Signal Lamp Tower - YES Computer Type - Y2K Pentium Computer W/4.433 SW Robot Type - Single arm C1 Cassette Platform - 150mm Front Monitor - LCD Side Monitor - LCD Integrated SMIF - NO SECS / GEMS - YES Micro Contamination Option - YES Process Type - Dielectric Heater Block P/N - Pinned, scribed (CPS) Shower Head P/N - OEM Shower heads, 8 stations Digital Dynamics IOC - NO Heated Valves - YES Gate Valve Mfg & Model - VAT Throttle Valve - VAT RF Match Type - TRAZAR HF RF Generator - RFG3000 LF RF Generator - PDX1400 Sigma 6 TEOS Cabinet - NO Duraflo Cabinet - NO End Point Detector - YES Included With System- NO Manufacturer- Edwards Included With System- YES Gas Line # Gas 1 N2 2 SiH4 3 SiH4 2% 4 PH3 5 N2O 6 NH3 7 C2F6 8 O2 *gases not in a specific orderOEM 型号描述
The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.文件
无文件