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LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"
  • LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"
  • LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"
  • LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"
  • LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"
说明
无说明
配置
Machine Type: PE-SiH4
OEM 型号描述
The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.
文件

无文件

类别
PECVD

上次验证: 30 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

126877


晶圆尺寸:

6"/150mm


年份:

未知


Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS

CONCEPT ONE "C1"

verified-listing-icon
已验证
类别
PECVD
上次验证: 30 多天前
listing-photo-ae311d5527f0443a88f8e8717cabcba6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44042/ae311d5527f0443a88f8e8717cabcba6/f05fce26d8f24c99bc4be3a2512ad90e_199c7bdac4524b6a9b317caebd3f563d45005c_mw.jpeg
listing-photo-ae311d5527f0443a88f8e8717cabcba6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44042/ae311d5527f0443a88f8e8717cabcba6/0366935c75234a63ac7a9ab4d4298bde_f4963e69946c4af6b733149a54bfb75245005c_mw.jpeg
listing-photo-ae311d5527f0443a88f8e8717cabcba6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44042/ae311d5527f0443a88f8e8717cabcba6/e3eac6a1095e46b4a9928daadadee83b_8515096874a7469bb0eba0cdc28eee9545005c_mw.jpeg
listing-photo-ae311d5527f0443a88f8e8717cabcba6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44042/ae311d5527f0443a88f8e8717cabcba6/64a4cdd4bcf14da59bd725d112a8f97e_aaabb8e4cdea432ba3b7937ff74d3a0e_mw.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

126877


晶圆尺寸:

6"/150mm


年份:

未知


Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
Machine Type: PE-SiH4
OEM 型号描述
The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.
文件

无文件

类似上架物品
查看全部