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LAM RESEARCH / NOVELLUS CONCEPT THREE "C3" SPEED
    说明
    HDP(2 chamber)
    配置
    无配置
    OEM 型号描述
    The Novellus Concept Three Speed is an advanced system designed for 300 mm wafers, boasting a proprietary hemispherical ion source and bi-polar electrostatic chuck. These innovative features ensure superior ion uniformity and precise temperature control. Even as the elements are scaled up for 300 mm wafers, the ion uniformity remains consistent due to the inherent design characteristics of the ion source. Additionally, an optimized gas delivery system enhances the overall within-wafer uniformity, further improving the system's performance.
    文件

    无文件

    PREFERRED
     
    SELLER
    类别
    PECVD

    上次验证: 60 多天前

    Buyer pays 12% premium of final sale price
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    118537


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    PREFERRED
     
    SELLER

    LAM RESEARCH / NOVELLUS

    CONCEPT THREE "C3" SPEED

    verified-listing-icon
    已验证
    类别
    PECVD
    上次验证: 60 多天前
    listing-photo-07efa4213d3a460f868e8e11292c6726-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Buyer pays 12% premium of final sale price
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    118537


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    HDP(2 chamber)
    配置
    无配置
    OEM 型号描述
    The Novellus Concept Three Speed is an advanced system designed for 300 mm wafers, boasting a proprietary hemispherical ion source and bi-polar electrostatic chuck. These innovative features ensure superior ion uniformity and precise temperature control. Even as the elements are scaled up for 300 mm wafers, the ion uniformity remains consistent due to the inherent design characteristics of the ion source. Additionally, an optimized gas delivery system enhances the overall within-wafer uniformity, further improving the system's performance.
    文件

    无文件