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OXFORD PLASMALAB 133
    说明
    无说明
    配置
    Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:26 AMPS26 AMPS Dimensions: StandardMetric Overall:52 x 22 x 49 IN - 500 LBS1320.80 x 558.80 x 1244.60 mm - 226.80 kg
    OEM 型号描述
    The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.
    文件

    无文件

    OXFORD

    PLASMALAB 133

    verified-listing-icon

    已验证

    类别
    PECVD

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    41127


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD
    年份: 2010状况: 二手
    上次验证60 多天前

    OXFORD

    PLASMALAB 133

    verified-listing-icon
    已验证
    类别
    PECVD
    上次验证: 60 多天前
    listing-photo-3b3184b2a6b145e482df86483cdc13d7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/3b3184b2a6b145e482df86483cdc13d7/1b0b7651dcf348b194791589ef7eee7a_0177091d2a114f7d86ca3b17255a46bb1201a_mw.jpeg
    listing-photo-3b3184b2a6b145e482df86483cdc13d7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/3b3184b2a6b145e482df86483cdc13d7/7cf4c290fd3f489a9b47f8131c34f015_6d8eb63be02f4dada142e7dcf324f8a91201a_mw.jpeg
    listing-photo-3b3184b2a6b145e482df86483cdc13d7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/3b3184b2a6b145e482df86483cdc13d7/6e9e6832eb514cdc8886ba5260c6c5a1_270cf49121dd4deeaba3cb11831bca9a1201a_mw.jpeg
    listing-photo-3b3184b2a6b145e482df86483cdc13d7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45092/3b3184b2a6b145e482df86483cdc13d7/f036db30c1c640588c1b03a7312b5cf6_0123cb9802a04902bbb89cbaa10ef0731105c_mw.jpeg
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    41127


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:26 AMPS26 AMPS Dimensions: StandardMetric Overall:52 x 22 x 49 IN - 500 LBS1320.80 x 558.80 x 1244.60 mm - 226.80 kg
    OEM 型号描述
    The Oxford Plasmalab 133 is a system used for plasma etching through a process called Reactive Ion Etching (RIE). This refurbished system is designed for GaN etching and has a platen that measures 330mm. It has an RF power of 600W at a frequency of 13.56MHz and features a water-cooled electrode that can operate within a temperature range of 10°C to 80°C. The system also includes a load lock with a turbo pump and an end-point detection system that utilizes Verity Optical emission spectroscopy within the range of 200-800nm. The gas pod of the system has six lines, including mass flow controllers for gases such as Ar, CL, BCL3, and N2O.
    文件

    无文件

    类似上架物品
    查看全部
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD年份: 2010状况: 二手上次验证:60 多天前
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD年份: 0状况: 二手上次验证:60 多天前
    OXFORD PLASMALAB 133

    OXFORD

    PLASMALAB 133

    PECVD年份: 0状况: 二手上次验证:60 多天前