说明
All MFCs for above processes are operational bar the Silane one配置
PECVD 80+ SiNx Dep Functional tool Designed for 4” wafers but can do 6” Deposits SiO2, SiH4 & Amorphous Si @ 300c Has working MFCs to achieve above deposition Is an OIPT tool built 1998 Burner gas abatement Control PC Edwards E2M80 vacuum pump Rf GeneratorOEM 型号描述
The Oxford Plasmalab80Plus is a compact plasma processing system that can perform high-quality plasma-enhanced chemical vapor deposition (PECVD) of materials such as SiOx, SiNx, and SiOxNy. This system is suitable for a variety of applications, including the creation of photonics structures, passivation, and hard masks. The Plasmalab80Plus has a small footprint and offers versatile etch and deposition solutions with easy open loading. It is simple to install and operate, while still delivering excellent process quality. The open load design allows for quick wafer loading and unloading, making it ideal for research, prototyping, and low-volume production. The system also enables high-performance processes through optimized electrode cooling and precise substrate temperature control.文件
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OXFORD
PLASMALAB 80 PLUS
已验证
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
96391
晶圆尺寸：
4"/100mm, 6"/150mm
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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OXFORD
PLASMALAB 80 PLUS
类别
PECVD
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
96391
晶圆尺寸：
4"/100mm, 6"/150mm
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
All MFCs for above processes are operational bar the Silane one配置
PECVD 80+ SiNx Dep Functional tool Designed for 4” wafers but can do 6” Deposits SiO2, SiH4 & Amorphous Si @ 300c Has working MFCs to achieve above deposition Is an OIPT tool built 1998 Burner gas abatement Control PC Edwards E2M80 vacuum pump Rf GeneratorOEM 型号描述
The Oxford Plasmalab80Plus is a compact plasma processing system that can perform high-quality plasma-enhanced chemical vapor deposition (PECVD) of materials such as SiOx, SiNx, and SiOxNy. This system is suitable for a variety of applications, including the creation of photonics structures, passivation, and hard masks. The Plasmalab80Plus has a small footprint and offers versatile etch and deposition solutions with easy open loading. It is simple to install and operate, while still delivering excellent process quality. The open load design allows for quick wafer loading and unloading, making it ideal for research, prototyping, and low-volume production. The system also enables high-performance processes through optimized electrode cooling and precise substrate temperature control.文件
无文件