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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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PLASMATHERM LAPECVD
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    文件

    无文件

    PLASMATHERM

    LAPECVD

    verified-listing-icon

    已验证

    类别
    PECVD

    上次验证: 8 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    114751


    晶圆尺寸:

    未知


    年份:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD
    年份: 2009状况: 二手
    上次验证60 多天前

    PLASMATHERM

    LAPECVD

    verified-listing-icon
    已验证
    类别
    PECVD
    上次验证: 8 天前
    listing-photo-7a6787c3d8ad406889461cc466aaf415-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    114751


    晶圆尺寸:

    未知


    年份:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    文件

    无文件

    类似上架物品
    查看全部
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD年份: 2009状况: 二手上次验证:60 多天前
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD年份: 2006状况: 二手上次验证:8 天前