说明
无说明配置
Main Process- ALSICU PVD configOEM 型号描述
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.文件
无文件
APPLIED MATERIALS (AMAT)
ENDURA 5500
已验证
类别
PVD / Sputtering
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
116496
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
ENDURA 5500
类别
PVD / Sputtering
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
116496
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Main Process- ALSICU PVD configOEM 型号描述
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.文件
无文件