说明
Last processed 6” wafer was Oct’21, currently the tool is not running with power-off condition.配置
6" , can be upgraded to 8" 2 chambers SiO2 Clusterline machine that consist of 2x LL(LoadLock/Loading module) + TM(transfer module) + 1x Aligner(detect wafer flat) + 2x PM(process chamber) + 3x Degasser. The process chamber had run gases of O2, SF6, Ar, He, N2O, N2, NH3, SiH4, H2. Only process chamber was deposited with Silicon Nitride/Silicon OxideOEM 型号描述
未提供文件
无文件
EVATEC / UNAXIS / OERLIKON / BALZERS
CLUSTERLINE 200
已验证
类别
PVD / Sputtering
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
102898
晶圆尺寸：
6"/150mm, 8"/200mm
年份：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
EVATEC / UNAXIS / OERLIKON / BALZERS
CLUSTERLINE 200
类别
PVD / Sputtering
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
102898
晶圆尺寸：
6"/150mm, 8"/200mm
年份：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Last processed 6” wafer was Oct’21, currently the tool is not running with power-off condition.配置
6" , can be upgraded to 8" 2 chambers SiO2 Clusterline machine that consist of 2x LL(LoadLock/Loading module) + TM(transfer module) + 1x Aligner(detect wafer flat) + 2x PM(process chamber) + 3x Degasser. The process chamber had run gases of O2, SF6, Ar, He, N2O, N2, NH3, SiH4, H2. Only process chamber was deposited with Silicon Nitride/Silicon OxideOEM 型号描述
未提供文件
无文件