
说明
CVD配置
无配置OEM 型号描述
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.文件
无文件
类别
RTP/RTA
上次验证: 29 天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
136793
晶圆尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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3000
类别
RTP/RTA
上次验证: 29 天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
136793
晶圆尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
CVD配置
无配置OEM 型号描述
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.文件
无文件