说明
无说明配置
A. Dual beam B. TLD and CDEM Detectors C. Integrated EDS Detector D. ELSTAR UHR Electron column E. Sidewinder Ion column F. Omni probe nanomanipulator G. Plasma cleaner H. Vacuum system I. (3) IGPs J. Water-cooled turbo and dry PVP K. 5-Axis (X, Y, Z, R, Tilt), Compucentric stage, 300 mm piezo L. GIS chemistries: IEE, EE, C, Pt, W, H20, IDEP M. Gas injection system: Maximum (4) Injectors, 1 Included, Pt/W N. Operating system: Windows OSOEM 型号描述
Helios NanoLab 1200 Full Wafer DualBeam Technology for High Resolution Imaging, Analysis and TEM Sample Preparation for 300 mm Wafers文件
无文件
类别
SEM / FIB
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
149104
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILIPS
HELIOS NANOLAB 1200
类别
SEM / FIB
上次验证： 3 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
149104
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
A. Dual beam B. TLD and CDEM Detectors C. Integrated EDS Detector D. ELSTAR UHR Electron column E. Sidewinder Ion column F. Omni probe nanomanipulator G. Plasma cleaner H. Vacuum system I. (3) IGPs J. Water-cooled turbo and dry PVP K. 5-Axis (X, Y, Z, R, Tilt), Compucentric stage, 300 mm piezo L. GIS chemistries: IEE, EE, C, Pt, W, H20, IDEP M. Gas injection system: Maximum (4) Injectors, 1 Included, Pt/W N. Operating system: Windows OSOEM 型号描述
Helios NanoLab 1200 Full Wafer DualBeam Technology for High Resolution Imaging, Analysis and TEM Sample Preparation for 300 mm Wafers文件
无文件