说明
无说明配置
Ozone resist stripOEM 型号描述
Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.文件
无文件
SEMITOOL
SIRIUS
已验证
类别
Spray Solvent / Acid
上次验证： 25 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
111843
晶圆尺寸：
未知
年份：
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEMITOOL
SIRIUS
类别
Spray Solvent / Acid
上次验证： 25 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
111843
晶圆尺寸：
未知
年份：
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Ozone resist stripOEM 型号描述
Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.文件
无文件