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说明
Function: exposure machine Structure: modular module structure CD 0.4um配置
无配置OEM 型号描述
Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60文件
无文件
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
123815
晶圆尺寸：
未知
年份：
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ASML
PAS 5500/100D
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
123815
晶圆尺寸：
未知
年份：
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Function: exposure machine Structure: modular module structure CD 0.4um配置
无配置OEM 型号描述
Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60文件
无文件