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ASML PAS 5500/100D
    说明
    Function: exposure machine Structure: modular module structure CD 0.4um
    配置
    无配置
    OEM 型号描述
    Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60
    文件

    无文件

    类别
    Steppers & Scanners

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    123815


    晶圆尺寸:

    未知


    年份:

    1995


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    ASML

    PAS 5500/100D

    verified-listing-icon
    已验证
    类别
    Steppers & Scanners
    上次验证: 60 多天前
    listing-photo-7fcf6f1b9db44d4e94121109dfdadaec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/7fcf6f1b9db44d4e94121109dfdadaec/9bc14371027b4668a135e5db44c56bde_1_mw.jpg
    listing-photo-7fcf6f1b9db44d4e94121109dfdadaec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/7fcf6f1b9db44d4e94121109dfdadaec/cad6160f48634438901fbdc28925bfa4_2_mw.jpg
    listing-photo-7fcf6f1b9db44d4e94121109dfdadaec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/7fcf6f1b9db44d4e94121109dfdadaec/8f6e10fb8d6b4d0f80d2ba36cfc28dcb_5_mw.jpg
    listing-photo-7fcf6f1b9db44d4e94121109dfdadaec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/7fcf6f1b9db44d4e94121109dfdadaec/d9fbaf8340e14b169ca608b698e65ecf_3_mw.jpg
    listing-photo-7fcf6f1b9db44d4e94121109dfdadaec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/7fcf6f1b9db44d4e94121109dfdadaec/f148363a0638490290131fb400fb843f_6_mw.jpg
    listing-photo-7fcf6f1b9db44d4e94121109dfdadaec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/7fcf6f1b9db44d4e94121109dfdadaec/f9e146821b5b4e87aa21518089448214_7_mw.jpg
    listing-photo-7fcf6f1b9db44d4e94121109dfdadaec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/7fcf6f1b9db44d4e94121109dfdadaec/32eb91c602d2411dac36b3f5c7d885f0_8_mw.jpg
    listing-photo-7fcf6f1b9db44d4e94121109dfdadaec-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48862/7fcf6f1b9db44d4e94121109dfdadaec/96bb5560ac7b4d2d9a32d573f607c9b1_4_mw.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    123815


    晶圆尺寸:

    未知


    年份:

    1995


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Function: exposure machine Structure: modular module structure CD 0.4um
    配置
    无配置
    OEM 型号描述
    Designed for mass production at 0.4 µm and achieves extremely high throughout while maintaining versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of subhalf-micron design rules by optimizing both depth of focus and resolution for critical process layers. NA:0.60
    文件

    无文件