说明
PLXI30 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -配置
无配置OEM 型号描述
The PAS 5500/400C i-Line Step & Scan system has a variable NA (0.48 to 0.65) 4x projection lens, which combined with ASML’s AERIAL™ Illuminator provides 280nm resolution. ASML’s revolutionary Step & Scan stage technology enables users to take full advantage of the AERIAL™ Illumination intensity and advanced i-Line resists for throughputs of greater than 114 200mm wph. Long-term production overlay is less than 35nm. The PAS 5500/400C Step & Scan system’s resolution and productivity ensures the lowest operating cost for advanced i-Line lithography.文件
无文件
类别
Steppers & Scanners
上次验证： 12 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
149295
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/400C
类别
Steppers & Scanners
上次验证： 12 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
149295
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
PLXI30 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -配置
无配置OEM 型号描述
The PAS 5500/400C i-Line Step & Scan system has a variable NA (0.48 to 0.65) 4x projection lens, which combined with ASML’s AERIAL™ Illuminator provides 280nm resolution. ASML’s revolutionary Step & Scan stage technology enables users to take full advantage of the AERIAL™ Illumination intensity and advanced i-Line resists for throughputs of greater than 114 200mm wph. Long-term production overlay is less than 35nm. The PAS 5500/400C Step & Scan system’s resolution and productivity ensures the lowest operating cost for advanced i-Line lithography.文件
无文件