说明
System Issues: 1.wafer stage leakage power off 2.reticle changer robot arm damaged 3. Reticle pre-align stage damaged 4.Computer damaged Cymer XLA 130 laser 1.Cymer chamber(MO/PA) damaged配置
ArF scanner (4X) Includes a Canon FPA-60000AS4 main body, Cymer laser, and chiller.OEM 型号描述
The FPA-6000AS4 is an ArF scanner that is the industry’s fastest and has the highest NA (0.85). It can project features as small as 85nm and is built on Canon’s new 140-wph, F2-capable FPA-6000 single-stage platform. It provides a cost-optimized solution for high volume 300mm or 200mm exposure processes for leading-edge device manufacturers choosing a mix-and-match strategy. The scanner has a 0.85-NA, 4:1 reduction lens system and is capable of 85-nanometer resolution with an overlay precision of 18nm.文件
无文件
CANON
FPA-6000AS4
已验证
类别
Steppers & Scanners
上次验证： 13 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Down
产品编号：
115821
晶圆尺寸：
未知
年份：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CANON
FPA-6000AS4
类别
Steppers & Scanners
上次验证： 13 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Down
产品编号：
115821
晶圆尺寸：
未知
年份：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
System Issues: 1.wafer stage leakage power off 2.reticle changer robot arm damaged 3. Reticle pre-align stage damaged 4.Computer damaged Cymer XLA 130 laser 1.Cymer chamber(MO/PA) damaged配置
ArF scanner (4X) Includes a Canon FPA-60000AS4 main body, Cymer laser, and chiller.OEM 型号描述
The FPA-6000AS4 is an ArF scanner that is the industry’s fastest and has the highest NA (0.85). It can project features as small as 85nm and is built on Canon’s new 140-wph, F2-capable FPA-6000 single-stage platform. It provides a cost-optimized solution for high volume 300mm or 200mm exposure processes for leading-edge device manufacturers choosing a mix-and-match strategy. The scanner has a 0.85-NA, 4:1 reduction lens system and is capable of 85-nanometer resolution with an overlay precision of 18nm.文件
无文件