说明
-Currently installed in demonstration cleanroom in working condition.配置
• High Throughput A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers). • High Resolution and Modified Illumination The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better. With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse process requirements, including rough and middle layers. • Overall Alignment Accuracy The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy. Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved. • Refined Operation Interface The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements. Specifications Resolution: 0.35μm or better N.A.: 0.63 Exposure light source: i line Reduction ratio:1:5 Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm Alignment accuracy (EGA, |x|+3σ):40nm or better Alignment system:LSA(standard), FIA(standard), LIA(optional)OEM 型号描述
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).文件
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NIKON
NSR-2205i14E2
已验证
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
42825
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NIKON
NSR-2205i14E2
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
42825
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
-Currently installed in demonstration cleanroom in working condition.配置
• High Throughput A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers). • High Resolution and Modified Illumination The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better. With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse process requirements, including rough and middle layers. • Overall Alignment Accuracy The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy. Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved. • Refined Operation Interface The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements. Specifications Resolution: 0.35μm or better N.A.: 0.63 Exposure light source: i line Reduction ratio:1:5 Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm Alignment accuracy (EGA, |x|+3σ):40nm or better Alignment system:LSA(standard), FIA(standard), LIA(optional)OEM 型号描述
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).文件
无文件