说明
Structure: Vapor deposition chamber, radical chamber, sputtering chamber Turbo molecular pump TMP-303LM <Vapor deposition chamber> Organic resistance heating x 10 points, metal zone x 4 points, resistance heating evaporation sources 2 boats/1 set, exhaust CRYO-U, Film controller CRTM-9000 (5 types for sensor organics, 2 types for metals), 2 constant current power supplies, high current power <radical chamber> O2 gas, RF200W <sputtering chamber> ITO sputtering, DC2kW, substrate heating possible, turbo molecule Pump TMP-803L G Box: VAC Model: VAC102282-OMNI-LAB 3φ200V 50/60Hz Approx. 59.4kVA配置
无配置OEM 型号描述
未提供文件
无文件
ULVAC
Mini-Lab
已验证
类别
Thermal Evaporators
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
70795
晶圆尺寸：
未知
年份：
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULVAC
Mini-Lab
类别
Thermal Evaporators
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
70795
晶圆尺寸：
未知
年份：
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Structure: Vapor deposition chamber, radical chamber, sputtering chamber Turbo molecular pump TMP-303LM <Vapor deposition chamber> Organic resistance heating x 10 points, metal zone x 4 points, resistance heating evaporation sources 2 boats/1 set, exhaust CRYO-U, Film controller CRTM-9000 (5 types for sensor organics, 2 types for metals), 2 constant current power supplies, high current power <radical chamber> O2 gas, RF200W <sputtering chamber> ITO sputtering, DC2kW, substrate heating possible, turbo molecule Pump TMP-803L G Box: VAC Model: VAC102282-OMNI-LAB 3φ200V 50/60Hz Approx. 59.4kVA配置
无配置OEM 型号描述
未提供文件
无文件