说明

Wet Bench Details Attached

配置

Tank 1: Recirc GAMA Module (SPM) Quartz Re-circulated Process Tank Sulfuric (H2SO4) Chemical Ratio: 9:1 Single HDPE Gravity Dispense Vessel for H2O2 (Using LE100 Level Sensors) Process Temperature: 90 - 150°C ± 2.0°C In-line Heater Bubbler Level Sensors 10:1 Dilution Drain Tank 2: Quick Dump Rinse Module (QDR) Tank 3: SC1 PLUS Megasonic Module (Single Use) Series 3 Quartz Megasonic Process Tank Automatic Chemical Blending for SC1 ratios (50:2:1,100:2:1 and NH4OH only) In-line Heater - Process temperature – 40 – 60° C Tank 4: SC1 PLUS Megasonic Module (Single Use) Series 3 Quartz Megasonic Process Tank Automatic Chemical Blending for SC1 ratios (50:2:1, 100:2:1 & NH4OH only) In-line Heater - Process temperature – 40 – 60° C Dryer: IPA Dryer Module PVDF Tank Assembly with Auto Lid Bulk Fill IPA

OEM 型号描述

The AKRION GAMA is a series of automated wet stations that are flexible and modular. They are suitable for a wide variety of cleaning, etching and stripping applications for bare and reclaimed silicon wafers, IC devices, MEMS and photomasks. The GAMA series is designed to provide high throughput and precision cleaning for semiconductor manufacturing processes.