说明
Wet Station (PFC), host station配置
无配置OEM 型号描述
The FC-821L is a single-bath cleaning system that integrates our finest chemical circulation cleaning technologies, perfected in our renowned multi-bath Wet Stations. It is an unprecedentedly efficient system that incorporates a low-pressure dryer to prevent water mark generation during the drying processes. The FC-821L meets all the rigorous challenges of next-generation cleaning by realizing quarter-micron processing with accelerated throughput yet reduced chemical consumption. By decreasing cleaning units, as in the popular FS-820L, we can offer compact designs and radical space savings than previous multi-bath systems. Installing the FC-821L directly adjoining the next process equipment significantly slashes space demands in limited clean room environments. Moreover, the consequent minimized wafer transfer between processings greatly inhibits the generation of native oxides and other contamination.文件
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SCREEN / DNS / DAINIPPON SCREEN
FC-821L
已验证
类别
Wet Benches - Auto
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
91207
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SCREEN / DNS / DAINIPPON SCREEN
FC-821L
类别
Wet Benches - Auto
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
91207
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Wet Station (PFC), host station配置
无配置OEM 型号描述
The FC-821L is a single-bath cleaning system that integrates our finest chemical circulation cleaning technologies, perfected in our renowned multi-bath Wet Stations. It is an unprecedentedly efficient system that incorporates a low-pressure dryer to prevent water mark generation during the drying processes. The FC-821L meets all the rigorous challenges of next-generation cleaning by realizing quarter-micron processing with accelerated throughput yet reduced chemical consumption. By decreasing cleaning units, as in the popular FS-820L, we can offer compact designs and radical space savings than previous multi-bath systems. Installing the FC-821L directly adjoining the next process equipment significantly slashes space demands in limited clean room environments. Moreover, the consequent minimized wafer transfer between processings greatly inhibits the generation of native oxides and other contamination.文件
无文件