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LAM RESEARCH / SEZ SP4300
  • LAM RESEARCH / SEZ SP4300
  • LAM RESEARCH / SEZ SP4300
  • LAM RESEARCH / SEZ SP4300
说明
Single Wafer Processing
配置
无配置
OEM 型号描述
The SEZ 4300 is a 300mm single wafer processing system that combines SEZ’s process capability with high reliability and throughput. It uses a dual arm robot to transport wafers from four FOUPs to four process chambers, where two media (acid or solvent) can be used. The media can be recycled, heated, and filtered within the system or used in single pass mode. The system has an object-oriented software architecture with a Sematech compliant GUI and touch screen for easy operation. It offers a cost-effective throughput/footprint ratio and competitive CoO. Options like EPD and ozone processing are available to meet customer needs. Supported applications include etching for structuring, layer thinning, and layer stripping.
文件

无文件

类别
Wet Etch

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

48208


晶圆尺寸:

12"/300mm


年份:

2001


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / SEZ

SP4300

verified-listing-icon
已验证
类别
Wet Etch
上次验证: 60 多天前
listing-photo-b4d0f45da1da48ec9cc68963c7233d27-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

48208


晶圆尺寸:

12"/300mm


年份:

2001


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Single Wafer Processing
配置
无配置
OEM 型号描述
The SEZ 4300 is a 300mm single wafer processing system that combines SEZ’s process capability with high reliability and throughput. It uses a dual arm robot to transport wafers from four FOUPs to four process chambers, where two media (acid or solvent) can be used. The media can be recycled, heated, and filtered within the system or used in single pass mode. The system has an object-oriented software architecture with a Sematech compliant GUI and touch screen for easy operation. It offers a cost-effective throughput/footprint ratio and competitive CoO. Options like EPD and ozone processing are available to meet customer needs. Supported applications include etching for structuring, layer thinning, and layer stripping.
文件

无文件