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LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
  • LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2130
说明
RESIST CLEAN, CU
配置
无配置
OEM 型号描述
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
文件

无文件

类别
Ashers / Plasma Cleaner

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

75989


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS / GASONICS

GAMMA 2130

verified-listing-icon
已验证
类别
Ashers / Plasma Cleaner
上次验证: 60 多天前
listing-photo-0f198b0db6b0438eb75c6d271f7d0ba4-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

75989


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
RESIST CLEAN, CU
配置
无配置
OEM 型号描述
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.
文件

无文件